Electro Plating, High-Purity Solvents

Hydroxypropyl butyne Diether Disulfonate Sodium Salt

Hydroxypropyl butyne Diether Disulfonate Sodium Salt, identified by CAS number 70247-04-8, is a high-performance anionic surfactant and functional additive primarily utilized in the electrochemical industry. This chemical compound is synthesized through the reaction of 2-butyne-1,4-diol with epichlorohydrin, followed by a strategic sulfonation process to enhance its solubility and ionic character. As a specialized polyether sulfonate, it functions as a potent leveling agent and brightener in acidic copper electroplating baths. Its unique triple-bond structure derived from the butyne backbone provides exceptional stability and electron density, facilitating uniform metal deposition across complex geometries. The sodium salt form ensures high water solubility and compatibility with various electrolyte systems. In industrial electrolytic processes, this compound is indispensable for achieving high-gloss, ductile copper layers while simultaneously reducing internal stress in the deposited metal. Its chemical resilience under high current densities makes it a preferred choice for advanced electronics manufacturing and high-end decorative finishing applications worldwide.

Attributes

Key Features and Benefits

  • Exceptional leveling power in acidic copper baths.
  • Enhances brightness and surface uniformity significantly.
  • High thermal stability during prolonged electrolysis cycles.
  • Strong anionic character ensuring excellent electrolyte compatibility.
  • Promotes ductile copper deposits with low internal stress.
  • Effectively reduces the formation of pinholes or pits.
  • Low foaming properties compared to traditional sulfonated additives.
  • Superior chemical stability at high current density ranges.
  • Facilitates the production of mirror-like metallic finishes easily.
  • Environmentally compliant with modern industrial safety standards for plating.
  • Improves the wetting of cathode surfaces during operation.
  • Reduces consumption of other costly brightener components.
Specifications

Technical Highlights

  • Molecular structure incorporates reactive alkyne triple bonds.
  • Effective concentration range typically 0.01 to 0.5 grams per liter.
  • Compatible with sulfuric acid and methane sulfonic electrolytes.
  • Maintains performance across a wide pH spectrum.
  • Exhibits high resistance to oxidative degradation during plating.
  • Enhances the throwing power of copper plating solutions.
  • Synergistic effects when used with polyethers and sulfur dyes.
  • Precise sulfonation degree ensures consistent surfactant functionality.
  • Low sensitivity to common metallic impurities in baths.
  • Proven efficiency in high-aspect-ratio hole filling for circuit boards.
  • Optimized for varying current densities in industrial settings.
  • High purity levels minimize unwanted side reactions.

Download Technical Data Sheet (TDS)

Practical industry uses

Applications

  • Primary brightener in acid copper electroplating processes.
  • Leveling agent for printed circuit board manufacturing.
  • Decorative plating for automotive parts and accessories.
  • Additive for high-speed wire and strip plating.
  • Semiconductor industry for advanced interconnect metallization steps.
  • Electroforming applications requiring high precision and smoothness.
  • Surface treatment for architectural hardware and plumbing fixtures.
  • Manufacturing of gravure printing cylinders and rollers.
  • Functional coating for electronic connectors and lead frames.
  • Base component in proprietary chemical formulations for metal finishing.
  • Specialized industrial coatings for heavy-duty engineering components.
  • High-quality plating for jewelry and premium consumer goods.
Key Sectors

Target Industries

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